McqMate
| Q. |
How a uniform film with good crystal structure is attained in cathode sputtering process? |
| A. | by hitting high energy particle directly on the substrate |
| B. | allowing less time for the particles to deposit on the substrate |
| C. | high energy particle diffuse through low pressure gas and deposits on the substrate |
| D. | heavy inert gas is used for film deposition on the substrate |
| Answer» C. high energy particle diffuse through low pressure gas and deposits on the substrate | |
| Explanation: the process of cathode sputtering is performed at a low pressure (about 10-12 torr). so, when the high energy particle landing on the substrate actually results in a very uniform film and adhesion. | |
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