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Q. |
Modified Chemical Vapor Deposition (MCVD) process is also called as an inside vapor phase oxidation (IVPD) technique. |
A. | true |
B. | false |
Answer» A. true | |
Explanation: mcvd process was developed by bell telephone laboratories and southampton university, uk. it is called as inside vapor phase oxidation (ivpo) as it takes place inside the silica tube at the temperatures between 1400 and 1600 degrees celsius. |
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