Q.

_________ is the stimulation of oxide formation by means of non-isothermal plasma maintained at low pressure in a microwave cavity surrounding the tube.

A. outside vapor phase oxidation (ovpo)
B. vapor axial deposition (vad)
C. modified chemical vapor deposition (mcvd)
D. plasma-activated chemical vapor deposition (pcvd)
Answer» D. plasma-activated chemical vapor deposition (pcvd)
2.5k
0
Do you find this helpful?
24

Discussion

No comments yet