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| Q. |
_________ is the stimulation of oxide formation by means of non-isothermal plasma maintained at low pressure in a microwave cavity surrounding the tube. |
| A. | outside vapor phase oxidation (ovpo) |
| B. | vapor axial deposition (vad) |
| C. | modified chemical vapor deposition (mcvd) |
| D. | plasma-activated chemical vapor deposition (pcvd) |
| Answer» D. plasma-activated chemical vapor deposition (pcvd) | |
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