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| Q. |
In maskant application, photo-resist masks ensure which of the following advantages? |
| A. | high accuracy |
| B. | ease of repetition |
| C. | ease of modification |
| D. | all of the mentioned |
| Answer» D. all of the mentioned | |
| Explanation: we will have the advantages which are mentioned above, if we use photo resist masking. | |
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