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Q. |
is the stimulation of oxide formation by means of non-isothermal plasma maintained at low pressure in a microwave cavity surrounding the tube. |
A. | outside vapor phase oxidation (ovpo) |
B. | vapor axial deposition (vad) |
C. | modified chemical vapor deposition (mcvd) |
D. | plasma-activated chemical vapor deposition (pcvd) |
Answer» D. plasma-activated chemical vapor deposition (pcvd) | |
Explanation: pcvd method was first developed by cuppers and koenig’s. it involves a plasma-induced chemical vapor deposition inside a silica tube. it is different from mcvd process as it involves stimulation of oxide formation by means of non-isothermal plasma. |
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