Q.

                   is the stimulation of oxide formation by means of non-isothermal plasma maintained at low pressure in a microwave cavity surrounding the tube.

A. outside vapor phase oxidation (ovpo)
B. vapor axial deposition (vad)
C. modified chemical vapor deposition (mcvd)
D. plasma-activated chemical vapor deposition (pcvd)
Answer» D. plasma-activated chemical vapor deposition (pcvd)
Explanation: pcvd method was first developed by cuppers and koenig’s. it involves a plasma-induced chemical vapor deposition inside a silica tube. it is different from mcvd process as it involves stimulation of oxide formation by means of non-isothermal plasma.
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